- IBM (Albany, NY)
- …engineers who will push boundaries in the development of cutting-edge patterning methodologies, plasma etch processes, and plasma etch infrastructures ... initial concept of film stacks and process flow through the development of plasma etch processes and its maturing as process of record to meet advanced logic… more
- IBM (Albany, NY)
- …will push boundaries in the development of cutting-edge patterning methodologies and plasma etch processes for next generation semiconductor technologies. In ... initial concept of film stacks and process flow through the development of plasma etch processes and its maturing as process of record to meet advanced logic… more